Light emitting device and fabrication method thereof

ABSTRACT

A method of fabricating a vertical light emitting diode including: growing a low doped first semiconductor layer on a sacrificial substrate; forming an aluminum layer on the low doped first semiconductor; forming an AAO layer having a large number of holes formed therein by anodizing the aluminum layer; etching and patterning the low doped first semiconductor layer using the aluminum layer as a shadow mask, thereby forming grooves; removing the aluminum layer remaining; sequentially forming a high doped first semiconductor layer, an active layer and a second semiconductor layer on the low doped first semiconductor layer with the grooves; forming a metal reflective layer and a conductive substrate on the second semiconductor layer; separating the sacrificial substrate; and forming an electrode pad on the other surface of the low doped first semiconductor layer, the electrode pad filled in the grooves and in ohmic contact with the high doped first semiconductor.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. patent application Ser. No.12/518,846, filed on Jun. 11, 2009 issued as U.S. Pat. No. 8,053,789,which is the National Stage of International Application No.PCT/KR2007/006463, filed Dec. 12, 2007, and claims priority from and thebenefit of Korean Patent Application No. 10-2006-0136681, filed on Dec.28, 2006, Korean Patent Application No. 10-2006-0136682, filed on Dec.28, 2006, and Korean Patent Application No. 10-2006-0136683, filed onDec. 28, 2006, which are all hereby incorporated by reference for allpurposes as if fully set forth herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a light emitting device and afabrication method thereof. More particularly, the present inventionrelates to a method of fabricating a substrate for a light emittingdiode, on which patterns are formed using an anodic aluminum oxide (AAO)layer as a shadow mask; a vertical light emitting diode having apatterned semiconductor layer using an AAO layer and a fabricationmethod thereof; and a light emitting device having scattering centersusing an AAO layer and a fabrication method thereof.

2. Discussion of the Background

A light emitting diode (LED), which is a representative one of lightemitting devices, is a photoelectric conversion device having astructure, in which an N-type semiconductor and a P-type semiconductorare joined together, and emits predetermined light through recombinationof electrons and holes. A GaN-based LED is known as such an LED. TheGaN-based LED is fabricated by sequentially laminating a GaN-basedN-type semiconductor layer, an active layer (or light emitting layer)and a P-type semiconductor layer on a substrate made of a material suchas sapphire or SiC.

Light generated in an LED is not entirely emitted to the outside, but alarge amount of light is lost inside the LED. Therefore, in order toenhance light efficiency of an LED, it is required to allow lightgenerated from the LED not to be lost inside a semiconductor but to beemitted to the outside as much as possible.

When light passes through an interface between two media havingdifferent refraction indices, reflection and transmission of the lightoccur at the interface between the two media. If an incident angle isgreater than a certain angle, transmission does not occur but totalreflection occurs. In this case, the certain angle is referred to as acritical angle.

Due to the total refraction, when light emitted from an active layerproceeds toward a transparent electrode with an angle over the criticalangle in an LED, the light is totally reflected at the transparentelectrode and confined within the LED to be absorbed into an epitaxiallayer and a sapphire substrate of the LED. Therefore, there is a problemthat light efficiency of the LED may be lowered.

To solve such a problem, there is a method using a patterned sapphiresubstrate (PSS).

FIG. 1 is a view illustrating a method of fabricating a patternedsapphire substrate according to a prior art.

Referring to FIG. 1, a bent pattern 3 is formed on a sapphire substrate1. A light emitting cell of an LED is grown on the pattern 3 of thesapphire substrate 1.

That is, before a semiconductor layer for forming a light emitting cellis grown, a bent pattern 3 with a specific shape is formed by patterninga sapphire substrate 1. Then, the semiconductor layer is grown on thebent pattern 3, thereby extracting the light that is not extracted tothe outside of an LED due to total refraction.

As such, the inside light can be extracted to the outside by designing astructure of an LED to have a difference of refraction indices in alateral direction.

However, in the prior art, since a photoresist layer 2 for forming thepattern 3 is formed on the substrate 1 and a pattern mask layer is thenfabricated by photolithography for removing a predetermined region ofthe mask layer 2, the pattern mask layer is restricted by the size ofthe pattern. As the size of a pattern formed on a substrate isincreased, a semiconductor layer should be grown to have a thicknessgreater than is necessary when the semiconductor layer is formed later.

In addition, as delicate photolithography is used, a fabrication processis difficult, fabrication cost is high, mass-productivity andreproductivity are lowered, and it is difficult to fabricate variousshapes of patterns.

Meanwhile, since a nitride of a Group III element, such as GaN or AlN,generally has an excellent thermal stability and a direct transitiontype energy band structure, it has recently come into the spotlight as asubstance for light emitting devices in blue and ultraviolet regions.Particularly, blue and green light emitting devices using GaN have beenused in a variety of fields such as large-scale, full-color flat paneldisplays, traffic lights, indoor illumination, high-density lightsources, high-resolution output systems and optical communications.

Such a nitride semiconductor layer of a Group III element, particularlyGaN, is grown on a different kind of substrate with a similar crystalstructure through a process such as metal organic chemical vapordeposition (MOCVD) or molecular beam epitaxy (MBE) because it isdifficult to fabricate the same kind of substrate on which the nitridesemiconductor layer can be grown. A sapphire substrate with a hexagonalsystem structure is mainly used as the different type of substrate.However, since sapphire is electrically nonconductive, the sapphirerestricts a structure of an LED. Since the sapphire is mechanically andchemically stable, the sapphire is difficult to be subjected toprocessing such as cutting or shaping and has low thermal conductivity.Therefore, studies have been recently conducted to fabricate an LED witha vertical structure by growing nitride semiconductor layers on adifferent kind of substrate such as sapphire and then separating thedifferent kind of substrate from the nitride semiconductor layers.

FIG. 2 is a sectional view of a vertical LED according to a prior art.

Referring to FIG. 2, the vertical LED has a conductive substrate 31.

The conductive substrate 31 may he a substrate made of Si, GaAs, GaP,AlGaInP, Ge, SiSe, GaN, AlInGaN, InGaN or the like, or a substrate madeof a single metal of Al, Zn, Ag, W, Ti, Ni, Au, Mo, Pt, Pd, Cu, Cr orFe, or an alloy thereof. Meanwhile, compound semiconductor layers areIII-N-based compound semiconductor layers. First and second conductivetypes respectively designate N-type and P-type, or P-type and N-type.

Compound semiconductor layers including a first conductive semiconductorlayer 15, an active layer 17 and a second conductive semiconductor layer19 are formed on the conductive substrate 31. Further, an ohmicelectrode layer 41, a metal reflective layer 43, a diffusion barrierlayer 45 and a bonding metal layer 47 are interposed between thesemiconductor layers and the conductive substrate 31.

The compound semiconductor layers are generally grown on a sacrificialsubstrate (not shown) such as a sapphire substrate by MOCVD or the like.Thereafter, the ohmic electrode layer 41, the metal reflective layer 43,the diffusion barrier layer 45 and the bonding metal layer 47 are formedon the compound semiconductor layers, and the conductive substrate 31 isthen attached thereto. Subsequently, the sacrificial substrate isseparated from the compound semiconductor layers using a laser lift-offtechnique or the like, and the first conductive semiconductor layer 15is exposed. An electrode pad 33 is then formed on the exposed firstconductive semiconductor layer 15. Accordingly, the conductive substrate31 with excellent heat radiation performance is employed, therebyimproving light emitting efficiency of an LED and providing the LED witha vertical structure as shown in FIG. 2.

In such a vertical LED, the first conductive semiconductor layer 15 maybe generally divided into a low doped first conductive semiconductorlayer 15 a, which is grown at a low doping concentration when it isinitially grown on a sacrificial substrate, and a high doped firstconductive semiconductor layer 15 b, which is grown at a high dopingconcentration on the low doped first conductive semiconductor layer 15a, depending on the doping concentration of dopant in growth of thefirst conductive semiconductor layer 15.

In order to improve an electrical characteristic and therefore a lightemitting characteristic when the first conductive semiconductor layer 15is exposed by the separation of the sacrificial substrate and theelectrode pad 33 is then formed on the exposed first conductivesemiconductor layer 15, the electrode pad 33 should be connected to thehigh doped first conductive semiconductor layer 15 b rather than the lowdoped first conductive semiconductor layer 15 a.

To this end, after separating the sacrificial substrate, the low dopedfirst conductive semiconductor layer 15 a should be removed through wetor dry etching or back surface grinding to expose the high doped firstconductive semiconductor layer 15 b. However, in order to etch the lowdoped first conductive semiconductor layer 15 a down to the high dopedfirst conductive semiconductor layer 15 b, it is important to manage theetching. Further, since the wet etching is defect etching, even theactive layer 17 may be damaged. Furthermore, since a precise processingis required for the different surface etching, it is difficult to ensureevenness.

SUMMARY OF THE INVENTION

An object of the present invention is to provide a patterned substratewhich is fabricated by easy processes and has a high mass-productivityand reproductivity.

Another object of the present invention is to have a large number ofscattering centers formed of an air layer by etching using an AAO layerin a semiconductor layer as a shadow mask so that light generated in anLED is not lost therein but emitted to the outside, thereby increasingthe amount of light scattered through the scattering centers formed ofthe air layer with a refraction index different from the semiconductorlayer to be emitted to the outside.

A further object of the present invention is to easily perform a processof forming an electrode pad on the first conductive semiconductor layerin a vertical LED so that the electrode pad is connected to a highlydoped portion of the first conductive semiconductor layer, which isexposed by separating a sacrificial substrate.

According to an aspect of the present invention, there is provided amethod of fabricating a patterned substrate for fabricating a lightemitting diode (LED), which comprises the steps of: forming an aluminumlayer on a substrate; forming an anodic aluminum oxide (AAO) layerhaving a large number of holes formed therein by performing anodizingtreatment of the aluminum layer; partially etching a surface of thesubstrate using the aluminum layer with a large number of the holes as ashadow mask, thereby forming patterns; and removing the aluminum layerremaining on the substrate.

Preferably, the substrate is any one of a sapphire substrate, a spinelsubstrate, a Si substrate, a SiC substrate, a ZnO substrate, a GaAssubstrate and a GaN substrate.

According to another aspect of the present invention, there is provideda method of fabricating a vertical LED, which comprises the steps of:growing a low doped first conductive semiconductor layer on asacrificial substrate; forming an aluminum layer on the low doped firstconductive semiconductor layer; forming an AAO layer having a largenumber of holes formed therein by performing anodizing treatment of thealuminum layer; etching and patterning the low doped first conductivesemiconductor layer using the aluminum layer with a large number of theholes as a shadow mask to expose a portion of the low doped firstconductive semiconductor layer, thereby forming a large number ofgrooves; removing the aluminum layer remaining on the low doped firstconductive semiconductor layer; sequentially forming a high doped firstconductive semiconductor layer, an active layer and a second conductivesemiconductor layer on the low doped first conductive semiconductorlayer with a large number of the grooves; forming a metal reflectivelayer and a conductive substrate on the second conductive semiconductorlayer; separating the sacrificial substrate; and forming an electrodepad on the other surface of the low doped first conductive semiconductorlayer, the electrode pad being filled in a large number of the groovesto be in ohmic contact with the high doped first conductivesemiconductor layer.

Preferably, the doping concentration of dopant in the high doped firstconductive semiconductor layer is 5 to 9×10¹⁸/cm³, and the dopingconcentration of dopant in the low doped first conductive semiconductorlayer is below 5×10¹⁸/cm³.

According to a further aspect of the present invention, there isprovided a vertical LED, comprising: a low doped first conductivesemiconductor layer having a large number of grooves formed therein; ahigh doped first conductive semiconductor layer formed on one surface ofthe low doped first conductive semiconductor layer, the high doped firstconductive semiconductor layer being exposed by a large number of thegrooves of the low doped first conductive semiconductor layer; an activelayer and a second conductive semiconductor layer, formed on one surfaceof the high doped first conductive semiconductor layer; a metalreflective layer and a conductive substrate, formed on one surface ofthe second conductive semiconductor layer; and an electrode pad formedon the other surface of the low doped first conductive semiconductorlayer, the electrode pad being filled in a large number of the groovesto be in ohmic contact with the high doped first conductivesemiconductor layer.

Preferably, the doping concentration of dopant in the high doped firstconductive semiconductor layer is 5 to 9×10¹⁸/cm³ and the dopingconcentration of dopant in the low doped first conductive semiconductorlayer is below 5×10¹⁸/cm³.

Preferably, the low doped first conductive semiconductor layer has alarge number of the grooves formed through etching using an AAO layer asa shadow mask.

According to a still further aspect of the present invention, there isprovided a method of fabricating a light emitting device having a firstconductive semiconductor layer, a second conductive semiconductor layerand an active layer interposed therebetween formed on a substrate. Themethod comprises the steps of: primarily growing the first conductivesemiconductor layer on the substrate; forming an aluminum layer on thefirst conductive semiconductor layer; forming an AAO layer having alarge number of holes formed therein by performing anodizing treatmentof the aluminum layer; etching and patterning the first conductivesemiconductor layer using the aluminum layer with a large number of theholes as a shadow mask so that a portion of the first conductivesemiconductor layer is etched; removing the aluminum layer remaining onthe first conductive semiconductor layer; secondarily growing the firstconductive semiconductor layer; and forming an active layer and a secondconductive semiconductor layer on the first conductive semiconductorlayer.

According to a still further aspect of the present invention, there isprovided a light emitting device, which comprises: a substrate; a firstconductive semiconductor layer formed on the substrate; an active layerformed on the first conductive semiconductor layer; and a secondconductive semiconductor layer formed on the active layer, wherein thefirst conductive semiconductor layer includes a large number ofscattering centers formed of an air layer.

Preferably, the first conductive semiconductor layer comprises a firstlayer having a large number of the scattering centers formed of an airlayer and a second layer formed on the first layer.

Preferably, a large number of the scattering centers formed of the airlayer are formed in the first conductive semiconductor layer throughetching using an AAO layer as a shadow mask.

According to the present invention, patterns can be formed on asubstrate by forming an AAO layer with a large number of holes byanodizing treatment of an aluminum layer and then performing etchingusing the aluminum layer with a large number of the holes as a shadowmask. In this case, the pattern may be formed to have a diameter of afew μm, e.g., 500 nm or less. As the diameter of the pattern is smallerthan that of a pattern produced by a method using a conventional mask,it is possible to reduce the thickness of a semiconductor layerlaminated on the substrate and to enhance the light emitting efficiency.

That is, as the diameter of the patterns formed on the substrate issimilar to the wavelength band of emitted light, the amount of lightreflected to the outside by the patterns formed on the substrate isincreased. Accordingly, the light emitting efficiency can be enhanced.

According to the present invention, it is possible to omit complicatedprocesses, such as a thin film layer forming process and a patterningand etching process, required to form a conventional mask (or patternlayer). Therefore, the conventional complicated processes required toform the mask (or pattern layer) are omitted, thereby enhancing themass-productivity and reproductivity and remarkably reducing yielddegradation and time loss caused by the conventional complicatedprocesses.

In addition, when performing anodizing treatment for forming an AAOlayer with a large number of holes formed thereon, the amplitude of avoltage, time and an amount of solution are controlled, whereby theshape and size of a pattern are also controlled. Accordingly, patternswith various shapes can be easily formed on a substrate if necessary.

According to the present invention, in a vertical LED, an AAO layer witha large number of holes is formed by performing anodizing treatment ofan aluminum layer on a low doped first conductive semiconductor layer,and etching is performed using the aluminum layer with a large number ofthe holes as a shadow mask, thereby forming patterns in the low dopedfirst conductive semiconductor layer. After forming a high doped firstconductive semiconductor layer thereon, a sacrificial substrate isseparated. Then, a portion of the high doped first conductivesemiconductor layer is exposed together by the patterns when the lowdoped first conductive semiconductor layer is exposed, thereby allowingan electrode pad to be in ohmic contact with the high doped firstconductive semiconductor layer. Accordingly, electrical properties ofthe vertical LED are improved and thus the light emitting efficiency canbe enhanced.

In addition, a concavo-convex portion is formed on a surface of the lowdoped first conductive semiconductor layer, through which light isemitted, thereby enhancing the light emitting efficiency.

According to the present invention, in a light emitting device, an AAOlayer with a large number of holes is formed through anodizing treatmentof an aluminum layer on a first conductive semiconductor layer, andetching is performed using the aluminum layer with a large number of theholes as a shadow mask, thereby forming patterns in the first conductivesemiconductor layer. Then, a first conductive semiconductor layer isformed again on the patterns, so that spaces in the patterns are formedas an air layer to function as scattering centers.

Therefore, since light generated by an active layer is scattered by thescattering centers formed of an air layer with a refraction indexdifferent from the first conductive semiconductor layer to beeffectively emitted to the outside, the light emitting efficiency can beenhanced.

At this time, the scattering center formed in the pattern may have adiameter of a few μm, e.g., 500 nm or less. A large number of scatteringcenters are formed in the first conductive semiconductor layer bysufficiently decreasing the diameter of the pattern, and the amount oflight reflected to the outside by the scattering centers is increased,thereby enhancing the light emitting efficiency.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a view illustrating a method of fabricating a patternedsapphire substrate according to a prior art.

FIG. 2 is a sectional view of a vertical light emitting diode (LED)according to a prior art.

FIGS. 3 to 6 are views illustrating a process of fabricating a patternedsubstrate according to an embodiment of the present invention.

FIG. 7 is a sectional view of a vertical LED according to anotherembodiment of the present invention.

FIGS. 8 to 16 are views illustrating a method of fabricating thevertical LED according to the other embodiment of the present invention.

FIG. 17 is a schematic sectional view of an LED according to a furtherembodiment of the present invention.

FIGS. 18 to 24 are views illustrating a process of fabricating the LEDshown in FIG. 17.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

Hereinafter, preferred embodiments of the present invention will bedescribed in detail with reference to the accompanying drawings. Thefollowing embodiments are provided only for illustrative purposes sothat those skilled in the art can fully understand the spirit of thepresent invention. Therefore, the present invention is not limited tothe following embodiments but may be implemented in other forms. In thedrawings, the widths, lengths, thicknesses and the like of elements maybe exaggerated for convenience of illustration. Like reference numeralsindicate like elements throughout the specification.

FIGS. 3 to 6 are views illustrating a process of fabricating a patternedsubstrate according to an embodiment of the present invention.

Referring to FIG. 3, an aluminum layer 20 is formed on a substrate 10.Here, a sapphire substrate may be used as the substrate 10.

The aluminum layer 20 is formed by depositing highly pure aluminum(99.999% Al) in a thickness of 500 nm to 3 μm using a known depositionmethod such as heat deposition, e-beam deposition, sputtering, or laserdeposition. After the aluminum layer 20 is deposited, it is heat treatedat 300 to 500° C. under an atmosphere of vacuum, nitrogen, argon or thelike. It will be apparent that the heat treatment for the aluminum layer20 may be omitted.

After the aluminum layer 20 is deposited, an anodic aluminum oxide (AAO)layer with a large number of holes 21 is formed by performing ananodizing treatment of the aluminum layer 20 once or more as shown inFIG. 4. Here, the holes 21 are formed up to a surface of the substrate10.

The process of forming an AAO layer with a large number of the holes 21in the aluminum layer 20 will be described. An aluminum layer 20 isfirst subjected to a primary anodizing treatment.

Here, the anodizing treatment is performed by depositing the aluminumlayer 20 in an acid solution and applying bias to a light emittingstructure.

Preferably, any one selected from a phosphoric acid solution, an oxalicacid solution and a sulfuric acid solution is used as the acid solution.

If the primary anodizing treatment is performed, the aluminum layer 20is oxidized inward from a surface thereof by an electric chemicalreaction, and thus a large number of hollows are formed inward from thesurface of the aluminum layer 20.

The portion oxidized by the primary anodizing treatment is then removedby an etchant, e.g., a mixed solution of phosphoric acid and chromicacid. If the oxidized portion in the aluminum layer 20 is removed, alarge number of the hollows are formed on the surface of the remainingaluminum layer 20 to correspond to the hollows formed by the primaryanodizing treatment.

Thereafter, the remaining aluminum layer 20 in the acid solution issubjected to a secondary anodizing treatment, thereby forming a largenumber of the holes 21 at positions corresponding to the hollows formedby the primary anodizing treatment up to a surface of the substrate 10as shown in FIG. 4.

Alternatively, if an AAO layer with a large number of the holes 21extending up to the top surface of the substrate 10 is formed byperforming only a primary anodizing treatment of the aluminum layer 20,subsequent processes after the aforementioned primary anodizingtreatment may be omitted. Still alternatively, it will be apparent thatthe anodizing treatment may be repeated three times or more using theaforementioned method.

FIG. 5 shows a photograph of an AAO layer formed by performing theanodizing treatment of the aluminum layer 20 using different acidsolutions, i.e., a phosphoric acid solution, an oxalic acid solution anda sulfuric acid solution. As can be seen in FIG. 5, the AAO layer with alarge number of the holes 21 is formed, and the size of the holes 21 mayvary depending on the applied voltage and the acid solution.

Meanwhile, the size of the holes 21 in the AAO layer can be adjusted bycontrolling an applied voltage, a solution and a processing time in theanodizing treatment. In a state where bias is applied while the AAOlayer is deposited in an oxalic acid solution used as an acid solution,the diameter of the holes 21 in the AAO layer may be increased as timeelapses.

As such, the aluminum layer 20 with a large number of the holes 21serves as a shadow mask in a subsequent process.

After forming the aluminum layer 20 having holes 21 with a desired size,the surface of the substrate 10 exposed through the holes 21 in thealuminum layer 20 is etched to a predetermined depth. The surface of thesubstrate 10 may be etched by a proper method such as dry or wetetching.

Thereafter, if the aluminum layer 20 is removed, a large number ofgrooves 11, for example, with a size of 500 nm or less, are formed inthe substrate 10 as shown in FIG. 6.

FIG. 7 is a sectional view of a vertical LED according to anotherembodiment of the present invention.

Referring to FIG. 7, compound semiconductor layers including a firstconductive semiconductor layer 55, an active layer 57 and a secondconductive semiconductor layer 59 are formed on a conductive substrate71. The conductive substrate 71 may be a substrate made of Si, GaAs,GaP, AlGaInP, Ge, SiSe, GaN, AlInGaN, InGaN or the like, or a substratemade of a single metal including Al, Zn, Ag, W, Ti, Ni, Au, Mo, Pt, Pd,Cu, Cr or Fe, or an alloy thereof. Meanwhile, the compound semiconductorlayers are III-N-based compound semiconductor layers. First and secondconductive types are respectively, designated N-type and P-type, orP-type and N-type.

An ohmic electrode 60 is interposed between the compound semiconductorlayers and the conductive substrate 71. The ohmic electrode 60 is inohmic contact with the second conductive semiconductor layer 59.Preferably, the ohmic electrode 60 is distributed over a large area ofthe second conductive semiconductor layer 59 for the purpose of currentspreading. The ohmic electrode 60 may be formed of Pt, Pd, Rh or Ni, ora metal including at least one thereof.

A metal reflective layer 63 is interposed between the ohmic electrode 60and the conductive substrate 71.

The metal reflective layer 63 may be formed of a metal with largereflectivity, e.g., Ag or Al, or a metal including at least one thereof.

Meanwhile, a bonding metal layer 67 may be interposed between the metalreflective layer 63 and the conductive substrate 71, and a diffusionbarrier layer 65 may be interposed between the bonding metal layer 67and the metal reflective layer 63. The bonding metal layer 67 enhancesan adhesive strength between the conductive substrate 71 and the metalreflective layer 63, thereby preventing the conductive substrate 71 frombeing separated from the metal reflective layer 63. The diffusionbarrier layer 65 prevents metal elements from being diffused into themetal reflective layer 63 from the bonding metal layer 67 or theconductive substrate 71, thereby maintaining reflectivity of the metalreflective layer 63.

In the meantime, an electrode pad 73 is positioned on the top surface ofthe compound semiconductor layers to be opposite to the conductivesubstrate 71. The electrode pad 73 may be in ohmic contact with thefirst conductive semiconductor layer 55. Alternatively, an ohmicelectrode layer (not shown) may be interposed between the electrode pad73 and the compound semiconductor layers. In addition, extensionportions (not shown) extending from the electrode pad 73 may bepositioned on the compound semiconductor layers. The extension portionsmay be employed such that a current flowing into the compoundsemiconductor layers is widely distributed.

At this time, the first conductive semiconductor layer 55 comprises alow doped first conductive semiconductor layer 55 a, portions of whichare etched by a pattern produced through etching using an AAO layer, anda high doped first conductive semiconductor layer 55 b, portions ofwhich are exposed by the etched portions of the low doped firstconductive semiconductor layer 55 a. Here, the doping concentration ofdopant in the high doped first conductive semiconductor layer 55 b is 5to 9×10¹⁸/cm³, while the doping concentration of dopant in the low dopedfirst conductive semiconductor layer 55 a is below 5×10¹⁸/cm³.

The electrode pad 73 is filled in the etched portions of the low dopedfirst conductive semiconductor layer 55 a to be electrically connectedto the high doped first conductive semiconductor layer 55 b.

FIGS. 8 to 16 are views illustrating a method of fabricating thevertical LED according to the other embodiment of the present invention.

Referring to FIG. 8, a sacrificial substrate 51 is prepared. Thesacrificial substrate 51 may be a sapphire substrate, which is notlimited thereto but may be a different kind of substrate.

A buffer layer 53 is formed on the sacrificial substrate 51, and a lowdoped first conductive semiconductor layer 55 a is formed on the bufferlayer 53. For example, the low doped first conductive semiconductorlayer 55 a may be an N-type semiconductor doped with Si dopants. As thelow doped first conductive semiconductor layer 55 a is formed on thebuffer layer 53, it is formed into a low doped layer with a lowconcentration of dopants.

The buffer layer 53 and the low doped first conductive semiconductorlayer 55 a are preferably formed by a metal organic chemical vapordeposition (MOCVD) method, but may be formed by a method such asmolecular beam epitaxy (MBE) or hydride vapor phase epitaxy (HVPE). Thebuffer layer 53 and the low doped first conductive semiconductor layer55 a are consecutively formed in the same processing chamber.

Thereafter, the aluminum layer 20 is formed on the top surface of thelow doped first conductive semiconductor layer 55 a as shown in FIG. 9.

The aluminum layer 20 is formed by depositing highly pure aluminum(99.999% Al) in a thickness of 500 nm to 3 μm by a known depositionmethod such as heat deposition, e-beam deposition, sputtering, or laserdeposition. After the aluminum layer 20 is deposited, it is heat treatedat 300 to 500° C. under an atmosphere of vacuum, nitrogen, argon or thelike. It will be apparent that the heat treatment for the aluminum layer20 may be omitted.

After the aluminum layer 20 is deposited, an AAO layer with a largenumber of holes 21 is formed by performing an anodizing treatment of thealuminum layer 20 once or more as shown in FIG. 10. Here, the holes 21are formed up to a surface of the low doped first conductivesemiconductor layer 55 a.

The process of forming an AAO layer with a large number of the holes 21in the aluminum layer 20 will be described. First, the aluminum layer 20is subjected to a primary anodizing treatment.

Here, the anodizing treatment is a treatment in which the aluminum layer20 is deposited in an acid solution and a bias is applied to a lightemitting structure.

Preferably, any one selected from a phosphoric acid solution, an oxalicacid solution and a sulfuric acid solution is used as the acid solution.

If the primary anodizing treatment is performed, the aluminum layer 20is oxidized inward from a surface thereof by an electric chemicalreaction, and thus a large number of hollows are formed inward from thesurface of the aluminum layer 20.

The portion oxidized by the primary anodizing treatment is then removedby an etchant, e.g., a mixed solution of phosphoric acid and chromicacid. If the oxidized portion in the aluminum layer 20 is removed, alarge number of the hollows are formed on the surface of the remainingaluminum layer 20 to correspond to the hollows formed by the primaryanodizing treatment.

Thereafter, the remaining aluminum layer 20 in the acid solution issubjected to a secondary anodizing treatment, thereby forming a largenumber of the holes 21 at positions corresponding to the hollows formedby the primary anodizing treatment up to a surface of the low dopedfirst conductive semiconductor layer 55 a as shown in FIG. 10.

Alternatively, if an AAO layer with a large number of the holes 21extending up to the top surface of the low doped first conductivesemiconductor layer 55 a is formed by performing only a primaryanodizing treatment of the aluminum layer 20, subsequent processes afterthe aforementioned primary anodizing treatment may be omitted. Stillalternatively, it will be apparent that the anodizing treatment may berepeated three times or more using the aforementioned method.

FIG. 11 shows a photograph of an AAO layer formed by performing theanodizing treatment of the aluminum layer 20 using different acidsolutions, i.e., a phosphoric acid solution, an oxalic acid solution anda sulfuric acid solution. As can be seen in FIG. 11, the AAO layer witha large number of the holes 21 is formed, and the size of the holes 21may vary depending on the applied voltage and the acid solution.

Meanwhile, the size of the holes 21 in the AAO layer can be adjusted bycontrolling an applied voltage, a solution and a processing time in theanodizing treatment. In a state where bias is applied while the AAOlayer is deposited in an oxalic acid solution used as an acid solution,the diameter of the holes 21 in the AAO layer may be increased as timeelapses.

As such, the aluminum layer 20 with a large number of the holes 21serves as a shadow mask in a subsequent process.

After forming the aluminum layer 20 having holes with a desired sizearrayed therein, the surface of the low doped first conductivesemiconductor layer 55 a exposed through the holes 21 in the aluminumlayer 20 is etched to a predetermined depth. The surface of the lowdoped first conductive semiconductor layer 55 a may be etched by aproper method such as dry or wet etching.

Thereafter, if the aluminum layer 20 is removed, a large number ofgrooves 54 with a size of 500 nm or less are formed in the low dopedfirst conductive semiconductor layer 55 a as shown in FIG. 12. A largenumber of the grooves 54 serve to expose a high doped first conductivesemiconductor layer 55 b which will be formed on the low doped firstconductive semiconductor layer 55 a.

Referring to FIG. 13, a high doped first conductive semiconductor layer55 b is grown on the low doped first conductive semiconductor layer 55 ahaving a large number of the grooves 54. The growth of the high dopedfirst conductive semiconductor layer 55 b is performed within theaforementioned processing chamber by an MOCVD method. According to apreferred embodiment of the present invention, the high doped firstconductive semiconductor layer 55 b is formed of GaN. Since the grooves54 formed in the low doped first conductive semiconductor layer 55 ahave a sufficiently small diameter, the grooves 54 are covered with thehigh doped first conductive semiconductor layer 55 b in a state wherethey are void, whereby the grooves 54 are formed as an air layer.

Thereafter, an active layer 57 and a second conductive semiconductorlayer 59 are sequentially formed on the top surface of the high dopedfirst conductive semiconductor layer 55 b within the same processingchamber, thereby being a laminated structure as shown in FIG. 14. Atthis time, the second conductive semiconductor layer 59 may be a P-typesemiconductor layer.

For example, the second conductive semiconductor layer 59 may be aP-type semiconductor formed by being doped with a P-type dopant such asZn or Mg.

Referring to FIG. 15, an ohmic electrode 60 is formed on the secondconductive semiconductor layer 59.

The ohmic electrode 60 is deposited on an entire surface of the secondconductive semiconductor layer 59 by a plating or deposition method. Theohmic electrode 60 contains a substance in ohmic contact with the secondconductive semiconductor layer 59. If the second conductivesemiconductor layer 59 is a P-type semiconductor, the ohmic electrode 60may be formed of a substance containing Pt, Pd, Rh or Ni. The ohmicelectrode 60 is generally heat treated to be in ohmic contact with thesecond conductive semiconductor layer 59. Since the ohmic electrode isformed of Pt, Pd, Rh or Ni, the heat treatment may be omitted.

A metal reflective layer 63 is then formed on the top surface of theohmic electrode 60. The metal reflective layer 63 is deposited on anentire surface of the ohmic electrode 60 by a plating or depositionmethod, and may be formed of a metal layer including Al or Ag.

A conductive substrate 71 is formed on the metal reflective layer 63.The conductive substrate 71 may be formed by attaching a substrate onthe compound semiconductor layers, which is made of Si, GaAs, GaP,AlGaInP, Ge, SiSe, GaN, AlInGaN, InGaN or the like, or a substrate madeof a single metal including Al, Zn, Ag, W, Ti, Ni, Au, Mo, Pt, Pd, Cu,Cr or Fe, or an alloy thereof. At this time, the conductive substrate 71may be attached to the metal reflective layer 63 through a bonding metallayer 67, and a diffusion barrier layer 65 may be formed on the metalreflective layer 63 before the bonding metal layer 67 is formed.Meanwhile, the conductive substrate 71 may be formed by a platingmethod. That is, the conductive substrate 71 may be formed by plating ametal such as Cu or Ni on the metal reflective layer 63. The diffusionbarrier layer 65 for preventing diffusion of metal elements and/or thebonding metal layer 67 for enhancing an adhesive strength may be added.

Referring to FIG. 16, the sacrificial substrate 51 is separated from thecompound semiconductor layers. The sacrificial substrate 51 may beseparated using a laser lift-off (LLO) technique or a mechanical orchemical method. At this time, the buffer layer 53 is also removed tothereby expose the first conductive semiconductor layer 55.

At this time, the low doped first conductive semiconductor layer 55 a isexposed to have a pattern shape with a large number of the grooves 54.In addition, portions of the high doped first conductive semiconductorlayer 55 b are exposed by a large number of the grooves 54 formed in thelow doped first conductive semiconductor layer 55 a.

Subsequently, the electrode pad 73 (in FIG. 7) is formed on the lowdoped first conductive semiconductor layer 55 a.

At this time, since the electrode pad 73 is made of a metal, theelectrode pad 73 is filled in a large number of the grooves 54 formed inthe low doped first conductive semiconductor layer 55 a to be in ohmiccontact with the high doped first conductive semiconductor layer 55 bwhen the electrode pad 73 is formed on the low doped first conductivesemiconductor layer 55 a.

While forming the electrode pad 73, extension portions (not shown)extending from the electrode pad 73 may be formed. Accordingly, thevertical LED in FIG. 7 is fabricated.

Meanwhile, before the electrode pad 73 is formed, an ohmic electrode(not shown) may be formed on the first conductive semiconductor layer55. The ohmic electrode is in ohmic contact with the first conductivesemiconductor layer 55, and the electrode pad 73 is electricallyconnected to the ohmic electrode.

FIG. 17 is a sectional view illustrating an LED according to a furtherembodiment of the present invention.

Referring to FIG. 17, the LED according to the embodiment of the presentinvention includes a substrate 100 that functions as a base. A lightemitting cell 200 comprising an N-type semiconductor layer 220, anactive layer 240 and a P-type semiconductor layer 260, is formed on thesubstrate 100.

Although the LED of this embodiment has one light emitting cell 200, anLED having a plurality of light emitting cells 200 to be operated by ACpower is also included in the spirit and scope of the present invention.Meanwhile, in the light emitting cell 200, a portion of the N-typesemiconductor layer 220 is exposed upward through mesa formation, and anN-type electrode pad 330 is formed in the exposed portion. Although thesubstrate 100 is preferably made of a sapphire material, it may be madeof another material with large conductivity, such as SiC.

As shown in this figure, the active layer 240 is restrictedly formed onone region of the N-type semiconductor layer 220 through mesa formation,and the P-type semiconductor layer 260 is formed on the active layer240. Thus, the region of the N-type semiconductor layer 220 comes intocontact with the active layer 240, and the other region of the N-typesemiconductor layer 220 is exposed to the outside. Although a portion ofthe N-type semiconductor layer 220 is removed to form the N-typeelectrode pad in this embodiment, a vertical LED, in which the substrateunder the N-type semiconductor layer 220 is removed, is also within thespirit and scope of the present invention.

The N-type semiconductor layer 220 may be formed of N-typeAl_(x)In_(y)Ga_(1-x-y)N(0≦x, y, x+y≦1), and may contain an N-type cladlayer. In addition, the P-type semiconductor layer 260 may be formed ofP-type Al_(x)In_(y)Ga_(1-x-y)N(0≦x, y, x+y≦1), and may contain a P-typeclad layer. The N-type semiconductor layer 220 may be formed by beingdoped with Si as a dopant, and the P-type semiconductor layer 260 may beformed by being doped, for example, with Zn or Mg as a dopant.

In particular, the N-type semiconductor layer 220 includes a largenumber of scattering centers 224 formed of an air layer. The scatteringcenters 224 are formed of the air layer produced in the N-typesemiconductor layer 220 through etching using an AAO layer.

The scattering effect within the N-type semiconductor layer 220 can bemaximized by a large number of the scattering centers 224 formed of anair layer with a refraction index different from the N-typesemiconductor layer 220. The configuration of the N-type semiconductorlayer 220 will be described in detail later.

In addition, a transparent electrode layer 320 made of a metal or metaloxide such as Ni/Au, ITO or ZnO is formed on the top surface of theP-type semiconductor layer 260, and a P-type electrode pad 340 is formedat a region of the top surface of the transparent electrode layer 320.

The active layer 240 is a region in which electrons and holes arerecombined, and contains InGaN. The wavelength of light emitted from thelight emitting cell 200 is determined depending on the kind of materialof the active layer 240. The active layer 240 may be a multi-layeredfilm having quantum well layers and barrier layers repeatedly formed.The barrier and quantum well layers may be binary to quaternary compoundsemiconductor layers expressed by a formula ofAl_(x)In_(y)Ga_(1-x-y)N(0≦x, y, x+y≦1).

A buffer layer 210 may be interposed between the substrate 100 and theN-type semiconductor layer 220. The buffer layer 210 is used to preventlattice mismatch between the substrate 100 and semiconductor layerswhich will be formed on the buffer layer 210. If the substrate 100 isconductive, the buffer layer 210 is formed of an insulating orsemi-insulating material so as to allow the substrate 100 to beelectrically insulated from the light emitting cell 200. For example,the buffer layer 210 may be formed of a nitride such as AlN or GaN. Inthe meantime, if the substrate 100 is insulative like sapphire, thebuffer layer 210 may be formed of a conductive material.

As has been briefly described above, the N-type semiconductor layer 220comprises a first N-type semiconductor layer 222 and a second N-typesemiconductor layer 226 thereon, sequentially grown. A large number ofthe scattering centers 224 formed of an air layer formed through etchingusing an AAO layer are provided between the first and second N-typesemiconductor layers 222 and 226.

The scattering centers 224 are formed by growing the first N-typesemiconductor layer 222, performing anodizing treatment of an aluminumlayer on the first N-type semiconductor layer 222 to form an AAO layerwith a large number of holes, etching the first N-type semiconductorlayer 222 using the aluminum layer with a large number of the holes as ashadow mask to form patterns with a large number of grooves, and thengrowing the second N-type semiconductor layer 226 on the patterns suchthat the grooves between the patterns is not filled and thus left as anair layer.

The scattering centers 224 are formed of an air layer with a refractiveindex different from the N-type semiconductor material within the N-typesemiconductor layer 220 to function as a reflecting minor for reflectinglight using the difference of the refraction indices.

Accordingly, the scattering centers 224 can reduce loss of lightgenerated from the active layer 240 in the semiconductor layer, andscattering is effectively generated by the scattering centers 224,thereby emitting light to the outside of the LED.

Hereinafter, a method of fabricating an LED according to an embodimentof the present invention will be described with reference to FIGS. 18 to24.

Referring to FIG. 18, a buffer layer 210 is formed on a substrate 100,and a first N-type semiconductor layer 222 is formed on the buffer layer210. The buffer layer 210 and the first N-type semiconductor layer 222are preferably formed by an MOCVD method, but may be formed by a methodsuch as MBE or HVPE. In addition, the buffer layer 210 and the firstN-type semiconductor layer 222 may be consecutively formed within thesame processing chamber.

In particular, the first N-type semiconductor layer 222 is a layerformed by being doped with Si dopants. The first N-type semiconductorlayer 222 is grown in a vertical direction on the substrate 100 with thebuffer layer 210 formed thereon. The N-type semiconductor layer 222 isgrown on a substrate through MOCVD.

Thereafter, an aluminum layer 20 is formed on the top surface of thefirst N-type semiconductor layer 222 as shown in FIG. 19.

The aluminum layer 20 is formed by depositing highly pure aluminum(99.999% Al) in a thickness of 500 nm to 3 μm by a known depositionmethod such as heat deposition, e-beam deposition, sputtering, or laserdeposition. After the aluminum layer 20 is deposited, it is heat treatedat 300 to 500° C. under an atmosphere of vacuum, nitrogen, argon or thelike. It will be apparent that the heat treatment for the aluminum layer20 may be omitted.

After the aluminum layer 20 is deposited, an AAO layer with a largenumber of holes 21 is formed by performing an anodizing treatment of thealuminum layer 20 once or more as shown in FIG. 20. Here, the holes 21are formed up to a surface of the first N-type semiconductor layer 222.

The process of forming an AAO layer with a large number of the holes 21in the aluminum layer 20 will be described. First, the aluminum layer 20is subjected to a primary anodizing treatment.

Here, the anodizing treatment is a treatment in which the aluminum layer20 is deposited in an acid solution and a bias is applied to a lightemitting structure.

Preferably, any one selected from a phosphoric acid solution, an oxalicacid solution and a sulfuric acid solution is used as the acid solution.

If the primary anodizing treatment is performed, the aluminum layer 20is oxidized inward from a surface thereof by an electric chemicalreaction, and thus a large number of hollows are formed inward from thesurface of the aluminum layer 20.

The portion oxidized by the primary anodizing treatment is then removedby an etchant, e.g., a mixed solution of phosphoric acid and chromicacid. If the oxidized portion in the aluminum layer 20 is removed, alarge number of the hollows are formed on the surface of the remainingaluminum layer 20 to correspond to the hollows formed by the primaryanodizing treatment.

Thereafter, the remaining aluminum layer 20 in the acid solution issubjected to a secondary anodizing treatment, thereby forming a largenumber of the holes 21 at positions corresponding to the hollows formedby the primary anodizing treatment up to a surface of the first N-typesemiconductor layer 222 as shown in FIG. 20.

Alternatively, if an AAO layer with a large number of the holes 21extending up to the top surface of the first N-type semiconductor layer222 is formed by performing only a primary anodizing treatment of thealuminum layer 20, subsequent processes after the aforementioned primaryanodizing treatment may be omitted. Still alternatively, it will beapparent that the anodizing treatment may be repeated three times ormore using the aforementioned method.

FIG. 21 shows a photograph of an AAO layer formed by performing theanodizing treatment of the aluminum layer 20 using different acidsolutions, i.e., a phosphoric acid solution, an oxalic acid solution anda sulfuric acid solution. As can be seen in FIG. 11, the AAO layer witha large number of the holes 21 is formed, and the size of the holes 21may vary depending on the applied voltage and acid solution.

Meanwhile, the size of the holes 21 in the AAO layer can be adjusted bycontrolling an applied voltage, a solution and a processing time in theanodizing treatment. In a state where bias is applied while the AAOlayer is deposited in an oxalic acid solution used as an acid solution,the diameter of the holes 21 in the AAO layer may be increased as timeelapses.

As such, the aluminum layer 20 with a large number of the holes 21serves as a shadow mask in a subsequent process.

After forming the aluminum layer 20 having holes 21 with a desired sizearrayed therein, the surface of the first N-type semiconductor layer 222exposed through the holes 21 in the aluminum layer 20 is etched to apredetermined depth. The surface of the first N-type semiconductor layer222 may be etched by a proper method such as dry or wet etching.

Thereafter, if the aluminum layer 20 is removed, a large number ofgrooves 224 with a size of 500 nm or less are formed in the first N-typesemiconductor layer 222 as shown in FIG. 22. A large number of thegrooves 224 function as scattering centers.

Referring to FIG. 23, a second N-type semiconductor layer 226 is formedon the first N-type semiconductor layer 222 with the scattering centers224 formed therein. The second N-type semiconductor layer 226 is grownwithin the aforementioned processing chamber by an MOCVD method.According to a preferred embodiment of the present invention, the secondN-type semiconductor layer 226 is formed of GaN. Since the grooves 224formed in the first N-type semiconductor layer 222 have a sufficientlysmall diameter, the grooves 224 are covered with the second N-typesemiconductor layer 226 in a state where they are void, whereby thegrooves 224 are formed as an air layer. Accordingly, the grooves 224function as scattering centers.

Thereafter, an active layer 240 and a P-type semiconductor layer 260 aresequentially formed on the top surface of the second N-typesemiconductor layer 226 within the same processing chamber, therebybeing a laminated structure as shown in FIG. 24. At this time, theP-type semiconductor layer 260 is doped with a P-type dopant such as Znor Mg.

Although not shown, a process of forming a transparent electrode layer320 (see FIG. 17) selected from Ni/Au, ITO and ZnO on the top surface ofthe P-type semiconductor layer 260, a process of forming a mesa forexposing a portion of the N-type semiconductor layer 220, and a processof respectively forming P-type and N-type electrode pads 340 and 330 atexposed regions of the transparent electrode layer 320 and the N-typesemiconductor layer 220 may be performed. Accordingly, the LED with astructure shown in FIG. 17 can be fabricated.

Alternatively, a vertical LED having P-type and N-type electrodes 340and 330 formed on upper and lower portions of a light emitting cell 200can be fabricated by performing a process of removing the substrate 100from the light emitting cell 200.

The present invention is not limited to the aforementioned embodiments,but various modifications and changes can be made thereto by thoseskilled in the art. The modifications and changes are included in thespirit and scope of the invention defined by the appended claims.

For example, a sapphire substrate is used in an embodiment of thepresent invention. However, it will be apparent that different types ofsubstrates, such as a spinel substrate, a Si substrate, a SiC substrate,a ZnO substrate, a GaAs substrate and a GaN substrate, may be usedinstead of the sapphire substrate.

What is claimed is:
 1. A method of fabricating a light emitting devicehaving a first conductivity-type semiconductor layer, a secondconductivity-type semiconductor layer and an active layer interposedtherebetween formed on a substrate, the method comprising: forming thefirst conductivity-type semiconductor layer on the substrate, whereinthe first conductivity-type semiconductor layer comprises a firstportion and a second portion; forming an aluminum layer on the firstportion of the first conductivity-type semiconductor layer; forming ananodic aluminum oxide (AAO) layer having a large number of holes formedtherein by performing an anodizing treatment of the aluminum layer;etching and patterning the first portion of the first conductivity-typesemiconductor layer using the aluminum layer with the large number ofthe holes as a shadow mask so that the first portion of the firstconductivity-type semiconductor layer is etched, wherein the etchedfirst portion comprises a plurality of scattering centers comprising anair layer, and the first portion is alternately arranged between eachscattering center of the plurality of scattering centers; removing thealuminum layer from the first portion of the first conductivity-typesemiconductor layer; forming the second portion of the firstconductivity-type semiconductor layer on the first portion of the firstconductivity-type semiconductor layer; and forming the active layer andthe second conductivity-type semiconductor layer on the first portion ofthe first conductivity-type semiconductor layer and the plurality ofscattering centers.
 2. A light emitting device, comprising: a substrate;a first conductivity-type semiconductor layer disposed on the substrate;an active layer disposed on the first conductivity-type semiconductorlayer; and a second conductivity-type semiconductor layer disposed onthe active layer, wherein the first conductivity-type semiconductorlayer comprises a plurality of scattering centers formed of an airlayer, wherein the first conductivity-type semiconductor layer comprisesa first portion and a second portion, wherein the first portion isalternately arranged between each scattering center of the plurality ofscattering centers, and wherein the second portion is arranged on thefirst portion and the plurality of scattering centers.
 3. The lightemitting device of claim 2, wherein the first conductivity-typesemiconductor layer comprises a first layer having the plurality ofscattering centers formed of the air layer and a second layer formed onthe first layer.
 4. The light emitting device of claim 2, wherein theplurality of scattering centers formed of the air layer are formed inthe first conductivity-type semiconductor layer through etching using ananodic aluminum oxide (AAO) layer as a shadow mask.
 5. The lightemitting device of claim 2, wherein the air layer is contained withinthe first conductivity-type semiconductor layer.
 6. The light emittingdevice of claim 2, wherein the active layer is not exposed to the airlayer.
 7. The light emitting device of claim 6, wherein the secondconductivity-type semiconductor layer is not exposed to the air layer.8. The light emitting device of claim 2, further comprising a bufferlayer arranged on the substrate, wherein the air layer is directlybetween the buffer layer and the first conductivity-type semiconductorlayer.
 9. A light emitting device, comprising: a substrate; a firstconductivity-type semiconductor layer disposed on the substrate; anactive layer disposed on the first conductivity-type semiconductorlayer; and a second conductivity-type semiconductor layer disposed onthe active layer, wherein the first conductivity-type semiconductorlayer comprises a plurality of scattering centers formed of an airlayer, wherein the first conductivity-type semiconductor layer comprisesa first portion and a second portion, wherein the first portioncomprises the plurality of scattering centers arranged therein, andwherein the second portion is arranged on the first portion.
 10. Thelight emitting device of claim 9, wherein the first conductivity-typesemiconductor layer comprises a first layer having the plurality ofscattering centers formed of the air layer and a second layer formed onthe first layer.
 11. The light emitting device of claim 9, wherein theplurality of scattering centers formed of the air layer are formed inthe first conductivity-type semiconductor layer through etching using ananodic aluminum oxide (AAO) layer as a shadow mask.
 12. The lightemitting device of claim 9, wherein the air layer is contained withinthe first conductivity-type semiconductor layer.
 13. The light emittingdevice of claim 9, wherein the active layer is not exposed to the airlayer.
 14. The light emitting device of claim 13, wherein the secondconductivity-type semiconductor layer is not exposed to the air layer.15. The light emitting device of claim 9, further comprising a bufferlayer arranged on the substrate, wherein the air layer is directlybetween the buffer layer and the first conductivity-type semiconductorlayer.
 16. A method of fabricating a light emitting device having afirst conductivity-type semiconductor layer, a second conductivity-typesemiconductor layer and an active layer interposed therebetween formedon a substrate, the method comprising: forming the firstconductivity-type semiconductor layer on the substrate, wherein thefirst conductivity-type semiconductor layer comprises a first portionand a second portion; forming an aluminum layer on the first portion ofthe first conductivity-type semiconductor layer; forming an anodicaluminum oxide (AAO) layer having a large number of holes formed thereinby performing an anodizing treatment of the aluminum layer; etching andpatterning the first portion of the first conductivity-typesemiconductor layer using the aluminum layer with the large number ofthe holes as a shadow mask so that the first portion of the firstconductivity-type semiconductor layer is etched, wherein the etchedfirst portion comprises a plurality of scattering centers comprising anair layer, and the first portion comprises the plurality of scatteringcenters arranged therein; removing the aluminum layer from the firstportion of the first conductivity-type semiconductor layer; forming thesecond portion of the first conductivity-type semiconductor layer on thefirst portion of the first conductivity-type semiconductor layer; andforming the active layer and the second conductivity-type semiconductorlayer on the first portion of the first conductivity-type semiconductorlayer and the plurality of scattering centers.